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  • Persian

A NEW APPROACH FOR CALCULATION OF PROJECTED RANGE DISTRIBUTIONS OF IMPLANTED IONS IN SEMICONDUCTORS

Document Type : Research Note

Authors

  • M. Moulavi kakhaki
  • H. Salari

School of Engineering, Department of Electrical - University of Mashhad

Abstract

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Keywords

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Sharif Journal of Civil Engineering
Vol. 21, No. 30
Science & Engineering
July 2005
Pages 65-75

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APA

Moulavi kakhaki, M. and Salari, H. (2005). A NEW APPROACH FOR CALCULATION OF PROJECTED RANGE DISTRIBUTIONS OF IMPLANTED IONS IN SEMICONDUCTORS. Sharif Journal of Civil Engineering, Vol. 21(No. 30), 65-75.

MLA

Moulavi kakhaki, M. , and Salari, H. . "A NEW APPROACH FOR CALCULATION OF PROJECTED RANGE DISTRIBUTIONS OF IMPLANTED IONS IN SEMICONDUCTORS", Sharif Journal of Civil Engineering, Vol. 21, No. 30, 2005, 65-75.

HARVARD

Moulavi kakhaki, M., Salari, H. (2005). 'A NEW APPROACH FOR CALCULATION OF PROJECTED RANGE DISTRIBUTIONS OF IMPLANTED IONS IN SEMICONDUCTORS', Sharif Journal of Civil Engineering, Vol. 21(No. 30), pp. 65-75.

CHICAGO

M. Moulavi kakhaki and H. Salari, "A NEW APPROACH FOR CALCULATION OF PROJECTED RANGE DISTRIBUTIONS OF IMPLANTED IONS IN SEMICONDUCTORS," Sharif Journal of Civil Engineering, Vol. 21 No. 30 (2005): 65-75,

VANCOUVER

Moulavi kakhaki, M., Salari, H. A NEW APPROACH FOR CALCULATION OF PROJECTED RANGE DISTRIBUTIONS OF IMPLANTED IONS IN SEMICONDUCTORS. Sharif Journal of Civil Engineering, 2005; Vol. 21(No. 30): 65-75.

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